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Annealsys Rapid Thermal Processing (RTP) furnaces can address various applications with an extended temperature range and vacuum capability.
The infrared lamp furnaces can perform annealing up to 1450°C and for duration up to 1 hour at 1200°C. The high temperature Zenith system can run process at 2000°C for 1 hour.
Applications include Rapid Thermal Annealing (RTA) processes like ohmic contact annealing and implantation annealing as well as Rapid Thermal Chemical Vapor Deposition (RTCVD) of graphene or hexagonal Boron Nitride (h-BN).
These versatile RTP systems can process samples from few mm² up to 200 mm diameter with manual loading or cassette to cassette robot handling for production, including customized solutions for processing compound semiconductor wafers with susceptors.
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Economical 3-inch Rapid thermal processing system
Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
The most powerful 3-inch rapid thermal processor for universities
The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications.
Rapid Thermal Processing furnaces for the development of rapid thermal annealing and CVD processes
Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.
The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.
The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100.
Far and Near – Up to one hour at 2000°C
High Temperature RTP-CVD furnace up to 2000°C up to one hour.
The Zenith is high temperature RTP system that can run a one hour process at 2000°C
The Zenith-150 system can process samples up to 6-inch diameter at temperature up to 2000°C. It is specially.
Rapid thermal processing system with square chamber
RTP system with square chamber for substrates up to 156 mm x156 mm. Multiple system configurations.
The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).
Perfect RTP system for production applications
The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used.
