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Built for today’s 2D material pioneers, the planarGROW-2S-BN is a compact, horizontal hot-wall CVD reactor designed specifically for h-BN film synthesis —while also supporting graphene growth in a single, integrated system. Whether you're working with liquid borazine or solid ammonia borane, this system handles both precursors with precision and safety, making it an excellent fit for advanced research environments.
Ideal for labs exploring next-gen dielectric materials, hybrid structures, and monolayer synthesis, this unit delivers dependable performance, recipe control, and sample repeatability—all in a compact footprint.
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Get full command of your process with an integrated Graphical User Interface (GUI) that simplifies operation.
Adjust gas flow, monitor furnace temperature, save your recipes, and activate auto mode for consistent, unattended growth cycles—
all with a user-friendly dashboard built for labs.
Designed based on the proven methodology of top researchers, including Prof. Ki Kang Kim, this system has contributed to multiple peer-reviewed publications.
Whether you’re growing h-BN on copper or nickel, the planarGROW-2S-BN is proven to deliver high-quality monolayers and thin films,
ready for electronic, optical, or dielectric applications.
We can help you with a solution tailor to your specific need.